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Reduce stamping artifacts when application slowly responds to redraw requests. This fixes and reintroduces logic previously removed in hrev53711. Previous logic was incorrect as it didn't take the possibility of multiple invalidations of different kinds (expose, update request) into account. Now separate update and expose regions are maintained and only expose region is cleared immediately. Change-Id: I0fd98cb1b45ccec285154e8c0d8e3a1400d156d7 Reviewed-on: https://review.haiku-os.org/c/haiku/+/6067 Reviewed-by: Jérôme Duval <jerome.duval@gmail.com> Tested-by: Commit checker robot <no-reply+buildbot@haiku-os.org>